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Ultrafast Carrier Thermalization in Hydrogenated Amorphous Silicon

机译:氢化非晶硅中的超快载体热化

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We present detailed studies of the initial relaxation processes of photoexcited carriers in hydrognated amorphous silicon. We have carried out time-resolved measurements of the photoexcited carrier response in HWCVD a-Si:H thin films using a wavelength-resolved femtosecond pump-probe technique, in which an intense 35-fs pump pulses excites carriers in the sample and a time-delayed probe pulse measures the resulting change in optical properties as a function of time delay following the pump pulse. Measurements of the transient optical absorbance were carried out as a function of the density of excited carriers, sample temperature, and probe wavelength. These studies indicate fast carrier thermalization via phonon emission on a ~150 fs time scale and rapid phonon equilibrium on a ~ 230 fs time scale.
机译:我们介绍了对红硅硅酮的初始放松过程的详细研究。我们已经在HWCVD A-Si:H薄膜中进行了时间分辨率测量,使用波长分辨的飞秒泵探针技术,其中强烈的35-FS泵脉冲激发样品中的载体和时间 - 作为泵脉冲之后的时间延迟的函数测量所得探针脉冲的所得变化。作为激发载体密度,样品温度和探针波长的函数进行瞬态光学吸光度的测量。这些研究通过在〜150fs时尺度和快速声子平衡上通过声子发射的快速载波热化,在〜230 fs时间尺度上。

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