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Local structure and Er~(3+) emission from pseudo-amorphous GaN: Er thin films

机译:伪无定形GaN的局部结构和ER〜(3+)排放:ER薄膜

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We report on strong Er~(3+) luminescence in the visible and infra-red regions at room temperature in amorphous GaN:Er thin films prepared by DC magnetron co-sputtering. The intensity of the Er~(3+) luminescence at 1.535 #mu#m corresponding to ~4I_(13/2) -> ~4I_(15/2) transitions is greatly enhanced after annealing at 750 deg C. In this material GaN crystallites have formed and embedded in the continuous amorphous matrix. The crystallites are 4 to 7 nm in diameter as analyzed by high resolution transmission electron microscopy. The absorption edge, extending three orders of magnitude in absorption coefficient in the spectral range from 0.5 to 3.5 eV, is superimposed on resonant absorption bands of Er~(3+) ions. The total photoluminescence spectrum consists of well-defined Er~(3+) luminescence peaks imposed on a broad band edge luminescence from the amorphous GaN host matrix.
机译:我们在无定形GaN的室温下在可见和红外区域中报告强烈的ER〜(3+)发光:通过DC磁控磁共振溅射制备的ER薄膜。 ER〜(3+)发光的强度为1.535#mu#m对应于〜4i_(13/2) - >〜4i_(15/2)转换在退火时在750℃下的退火后大大提高。在这种材料GaN中结晶形成并嵌入连续的无定形基质中。通过高分辨率透射电子显微镜分析,微晶的直径为4至7nm。吸收边缘,在光谱范围内的吸收系数中延伸三个数量级,叠加在ER〜(3+)离子的谐振吸收带上。总光致发光光谱由施加在来自非晶GaN宿主基质的宽带边缘发光上的良好定义的ER〜(3+)发光峰值。

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