Numerical study of pulsed-laser scanning deposition in a diluted ambient gas

摘要

Laser scanning deposition process is numerically investigated by the means of a Monte-Carlo method. The transport of the atoms ablated from the target through a diluted ambient gas is simulated. Specifically, the influences of the ambient gas (0.0133 - 13.3 Pa), the laser scanning radius, and the substrate-target distance on the spatial distribution and mean energy of the ablated atoms deposited on the substrate are studied. Knowledge useful to understanding the laser scanning deposition process is obtained.