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Synthesis of (Si_2Ge)C_x and related Ge_(1-x)C_x phases in the Si-Ge-C system

机译:SI-GE-C系统中的(SI_2GE)C_X和相关GE_(1-X)C_X阶段的合成

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The synthesis and characterization of binary and ternary semiconductor alloys and ordered phases based on C, Si and Ge are described. Thin films of these materials were synthesized using molecular precursors such as (SiH_3)_4C and (GeH_3)_4C in which the Si_4C and Ge_4C tetrahedra are incorporated as building blocks during deposition. Materials systems prepared include a new ordered structure (Si_2Ge)_(1-x)C_x (x=5percent), and Ge_(1-x)C_x hybrids of Ge and C-diamond. The (Si_2Ge)C_x phase has a P 3ml structure formed by ordering of the [111] lattice planes in a Ge-Si-Si sequence. The Ge-C materials display unusual morphologies ranging from coherent heterostructures to carbide nanorods and quantum dots which are formed by CVD reactions utilizing a new family of (GeH_3)_(4-x)CH_x (x=0-2) precursors. The morphology and microstructure in the samples is dependent upon the molecular design of the precursor and the carbon concentration.
机译:描述了基于C,Si和GE的二元和三元半导体合金的合成和表征和基于C,Si和Ge的有序相。这些材料的薄膜使用分子前体(如(SIH_3)_4C和(GEH_3)_4C合成,其中Si_4c和Ge_4c Tetrahedra在沉积期间作为构建块结合在一起。准备的材料系统包括新的有序结构(Si_2Ge)_(1-x)C_X(x = 5percent)和Ge和C-Diamond的Ge_(1-x)C_X混合物。 (Si_2Ge)C_X相位具有通过在GE-Si-Si序列中排序[111]格平面而形成的p 3ml结构。 GE-C材料显示出从相干异质结构到碳化物纳米棒和量子点的异形形态,其通过CVD反应形成新的(GEH_3)_(4-X)CH_X(x = 0-2)前体。样品中的形态和微观结构取决于前体和碳浓度的分子设计。

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