Practical Anti-Microbial Surfaces on Nylon and Polyester by UV Photochemistry

机译：UV光化学的尼龙和聚酯上的实用抗微生物表面

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Surface radicals generated by 193 nm (nylon) or 172 nm (PET) UV light afford strongly antimicrobial amine functionality by grafting or by transformation. They are broadly effective in the lab and significantly viable in the field.

机译：由193nm（尼龙）或172nm（PET）UV光产生的表面自由基通过接枝或通过转化提供强烈抗微生物胺官能团。它们在实验室中广泛有效，在该领域明显可行。

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《Quantum Electronics and Laser Science Conference》|2007年||共1页
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Michael J. Kelley; Zhengmao Zhu;
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4. Practical Anti-Microbial Surfaces on Nylon and Polyester by UV Photochemistry [C] . Michael J. Kelley, Zhengmao Zhu Quantum Electronics and Laser Science Conference . 2007

机译：UV光化学的尼龙和聚酯上的实用抗微生物表面
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Practical Anti-Microbial Surfaces on Nylon and Polyester by UV Photochemistry

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