It has been established that rather thermostable trimethylsilicyl covering is formed as a result of hexamethyldisilazan chemisorption on the colloid graphite surface. The closeness of trimethylsilicyl covering on carbon surface can be varied in some range by changing the pretreatment temperature of the carbon material. In this manner, an optimal hydrophily of carbon surface may be reached. It is possible to reach a chemical activity on carbon surface comparable with that of high-dispersed silica by way of depositing a monolayer of silicon dioxide on the surface of carbon materials. Furthermore, the deposition of a monolayer of silicon dioxide on carbon surface leads not only to a rise of chemical activity of carbon materials, but, also, to improving some of their adsorptional characteristics.
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