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Structure and mechanical properties of reactive sputter-deposited TiN/TaN multilayered films

机译:反应性溅射沉积锡/棕褐色多层薄膜的结构和力学性能

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TiN/TaN multilayers were grown by reactive magnetron sputtering on WC-Co sintered hard alloy and MgO(100) single crystal substrates. Multilayer structure and composition modulation amplitudes were studied using x-ray diffraction method. Hardness and elastic modulus were measured by nanoindentation tester. For bilayer thickness (A) larger than 80A, hardness are lower than rule-of-mixtures value of individual single layers, and increased rapidly with decreasing A, peaking at hardness values approx approx 33
机译:在WC-Co烧结硬合金和MgO(100)单晶基板上通过反应磁控溅射生长锡/棕褐色多层。使用X射线衍射法研究多层结构和组合调制幅度。通过纳米狭窄测试仪测量硬度和弹性模量。对于大于80a的双层厚度(a),硬度低于单层的混合物值,并且随着减小的a,硬度值达到峰值的快速增加约33

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