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Cathodic arc deposition of tetrahedral amorphous carbon: influence of process parameters on microstructure and hardness

机译:四面体非晶碳的阴极电弧沉积:过程参数对微观结构和硬度的影响

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The cathodic arc provides a method for depositing extremely hard thin carbon films. These films are potentially useful in a variety of tribological applications including protection of magnetic media and recording heads. Effective application of this technology requires an improved understanding of the influence of process parameters on the microstructure and hardness of the deposited films. In this work, we use a commercially available filtered cathodic arc to deposit tetrahedral amorphous carbon at several deposition angles.
机译:阴极电弧提供沉积极硬薄碳膜的方法。这些薄膜在各种摩擦学应用中可能有用,包括保护磁介质和记录头。该技术的有效应用需要改善对过程参数对沉积膜的微观结构和硬度的影响的理解。在这项工作中,我们使用商业上可获得的过滤的阴极电弧,以在几个沉积角度下沉积四面体非晶碳。

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