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High performance vanadium oxide thin film electrodes for rechargeable lithium batteries

机译:用于可充电锂电池的高性能氧化钒薄膜电极

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Plasma Enhanced Chemical Vapor Deposition (PECVD) was used to prepare vanadium oxide thin films as cathodes for rechargeable lithium batteries. The reactants consisted of a high vapor pressure liquid source of vanadium (VOCl_3) and hydrogen and oxygen gas. Deposition parameters s uch as the flow rates of H-2, O_2 and VOCl_3, the substrate temperature and the Rf power were optimized, and high depositioin rate of 11 A/s was obtained. Vanadium oxide films with high discharge capacities of up to 408 mAh/g were prepared. The films also showed a superior cycling stability between 4 and 1.5 V at a C/0.2 rate for more than 4400 cycles. The films were amorphous up to a deposition temperature of 300 deg C, however, deposition on to substrates with textured surfaces facilitated the formation of crystalline films. We demonstrate that both the vanadium oxide material and the PECVD deosition method are very attractive for coonstructing thin-film rechargeable lithium batteries with high capacity and long-term cyclic stability.
机译:等离子体增强的化学气相沉积(PECVD)用于制备氧化钒薄膜作为用于可充电锂电池的阴极。反应物由钒(VOCL_3)和氢气和氧气的高蒸气压液源。沉积参数S UCH作为H-2,O_2和VOCL_3的流速,优化了基板温度和RF功率,获得了11A / s的高沉淀率。制备具有高达408mAh / g的高放电容量的氧化钒膜。该薄膜还在4-1.5V的速率下以超过4400次循环的循环速度优异的循环稳定性。将薄膜的沉积温度为300℃,然而,沉积在具有纹理表面的基板上促进了结晶膜的形成。我们证明氧化钒材料和PECVD致义方法都非常有吸引力,对于具有高容量和长期环状稳定性的凝固薄膜可充电锂电池。

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