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Tantalum electrochemistry in chloride-fluoride and oxochloride-fluoride melts

机译:氯化物 - 氟化物中的钽电化学和氟化物熔融

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Two papers dedicated to studying tantalum electrodeposition from NaCl-KCl-K_2TaF_7 melt are knwon in the literature [1,2]. These authors showed that tantalum reduction occurred through a single reduction step: Ta(V)+5c <->Ta(0). In the first of them Lantelme et al. established a spontancous formation of tantalum and oxygen compounds on a tantalum wire emmersed in a molten electrolyte. The Na_2O and BaO additionsto the NaCl-KCl-K_2TaF_7 melt [1] at a molar ratio O/Ta-=1 resulted in formation of an oxohalide TaOCl_xF_y~(z-) complex, where z=x+y-3, to which a single peak of tantalum reductioon corresponded on voltammograms. The nature of this complex has not been established yet. Increase of the 2
机译:致力于从NaCl-Kcl-k_2taf_7熔体中研究钽电沉积的两篇论文是文献中的knwon [1,2]。这些作者表明,通过单一还原步骤进行钽减少:TA(V)+ 5C < - > TA(0)。在其中的第一个Lantelme等人。在熔化电解质中倾斜的钽丝上建立了钽和氧气的含氧化合物的含量。 Na_2O和BaO加入摩尔比O / Ta-= 1的NaCl-Kcl-k_2Taf_7熔体[1]导致氧化物Taocl_XF_Y〜(Z-)复合物的形成,其中Z = X + Y-3,钽氧化钽的单一峰值对应于伏安图。这个综合体的性质尚未建立。 2

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