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Bandpass filter by a stretch and double-exposure technique

机译:通过拉伸和双曝光技术的带通滤波器

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We fabricated a bandpass filter based on Moire Bragg grating in fiber with a uniform phase mask. We employed a stretch and two-exposure technique, in which the fiber was exposed to UV light from a KrF excimer through a phase mask and then the fiber is stretched and given another exposure at the same region. Due to the stretch, the periods of these two grating are slightly different, and there is a transmission between two reflection peaks at the Bragg wavelength of these two gratings. Applying different stretch can control the bandpass width of the filter. We measured the stretch characterization of a uniform Bragg grating and found the Bragg wavelength of the grating shifts linearly with the stretched length. We theoretically analyzed the grating structure and its reflection spectrum. The filter's characterization can be optimized by choosing appropriate parameters. We will give a theoretical discussion concerning which parameters and how they affect the filter's operation.
机译:我们通过均匀的相掩模制造了基于Moire Bragg光栅的带通滤波器。我们采用了一种伸展和两曝光技术,其中纤维通过相掩模从KRF准分子暴露于UV光,然后将纤维拉伸并在同一区域进行另一个暴露。由于拉伸,这两个光栅的周期略有不同,并且在这两个光栅的布拉格波长的两个反射峰之间存在透射。施加不同的拉伸可以控制过滤器的带通宽度。我们测量了均匀布拉格光栅的拉伸表征,并发现光栅的布拉格波长与拉伸长度线性地换档。理论上,我们分析了光栅结构及其反射光谱。过滤器的表征可以通过选择适当的参数来优化。我们将提供一个关于哪些参数以及它们如何影响过滤器操作的理论讨论。

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