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Thermo-Mechanical Properties of Ti-Ni Shape Memory Alloy Fabricated by Spark-Plasma Sintering

机译:火花等离子烧结制造的Ti-Ni形状记忆合金的热机械性能

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The fabrication of Ti-Ni shape memory alloy by elemental powders was attempted by using a spark- plasma sintering method that can produce high-density sintered compacts in a very short sintering time. The relations between the fabrication conditions and the microstructures, tensile properties and thermo-mechanical properties of the sintered compacts were investigated systematically. The appropriate sintering temperature that can fabricate the sintered compacts whose relative densities are as high as about 96% was found. The tensile properties of the as-sintered compact were able to be improved greatly by performing a solution treatment, and the tensile strength and elongation of the solution treated compact became 570 MPa and 6% respectively. The tensile properties of the solution-treated compact were able to be improved fairly by performing the aging treatment, and the tensile strength and elongation of the aged compact became 750 MPa and 6.5% respectively. This result is one of the highest tensile properties that have been reported in powder metallurgy field so far. The solution-treated compacts showed a super-elastic like behavior above 333 K. The recovery stresses of the shape memory treated compact and the aged compact after loading of 2% pre-strain at the temperature change from 293 K to 353 K were around 250 MPa. These shape memory treated compacts and aged compacts were well applicable to the shape memory elements due to their sufficient shape memory effect and good temperature-response.
机译:通过元素粉末的Ti-Ni系形状记忆合金的制造试图通过使用火花等离子体烧结,可以产生在很短的烧结时间的高密度烧结体的方法。制造条件和显微组织,拉伸性能和烧结体的热机械性质之间的关系系统地进行了研究。可以制造烧结体,其相对密度高达约96%,发现适当的烧结温度。的作为烧结体的拉伸性能能够通过执行固溶处理很大的提高,和溶液处理紧凑的拉伸强度和伸长率分别变为570兆帕和6%。固溶处理紧凑的拉伸性能是能够通过进行时效处理相当改善,老年紧凑的拉伸强度和伸长率分别变为750兆帕和6.5%。这个结果已经报道在粉末冶金领域迄今为止最高的拉伸性能之一。经过固溶处理的压块显示超弹性像上面333 K.行为形状记忆的恢复应力处理紧凑并且在从293 K至353 k中的温度变化2%的预应变的负荷后老化紧凑是约250兆帕。这些形状记忆处理压块和老化的压块以及适用于形状记忆元件由于它们的充分的形状记忆效应和良好的温度响应。

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