Recently, a two-dimensional (2D) photonic crystal pattern has become more important to enhance the light extraction efficiency of light emitting diodes (LEDs) [1]. However, it is difficult to realize the photonic crystal-patterned LED, which is made by e-beam lithography (EBL) [2] or laser interference lithography (LIL) [3], due to its expensiveness and time-consuming fabrication processes. In this work, we report the economical and effective fabrication process of photonic crystal patterns on GaN-based LED structures using nanoimprint lithography (NIL) and inductively coupled plasma (ICP) etching process.
展开▼
