A low-pressure and moderate-temperature imprint process using a low-viscosity thermocurable epoxy prepolymer was prepared for nanoimprint lithography on flexible plastic substrates. The resist can be imprinted at room temperature with a pressure of 1.2MPa, and then cured at 95°C for 10min to obtain nano-scaled and micro-scaled patterns. After being cooled to room temperature and separated, the desired patterns had been transferred completely on the resist film. Replications of high-density line patterns with resolution of 100nm to 500nm with an interval 100nm were obtained on a flexible ITO/PET substrate.
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