Nanoimprint lithography (NIL) is very useful lithography technique. It has excellent features, such as being able to create lithographic printing that is sub-10 nm size over a large area. Usually a Si or SiO{sub}2/ Si mold is used as a NIL mold, which is delineated by using electron beam (EB) lithography and dry etching. In a conventional NIL process, poly(methylmethacrylate)(PMMA) is used as a replicated material. NIL process must heat PMMA above the glass transition temperature to deform the physical shape of the resist with a mold. As a glass transition temperature of PMMA is 105°C, PMMA was heated at around 120°C for 10-20 min in NIL process.
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