Silicon-Carbon Thin-Film Materials Produced From Organosilanes in a Remote Hydrogen Plasma Chemical Vapor Deposition

摘要

Among chemical vapor deposition (CVD) techniques the remtoe plasma CVD also termed as indirect or afterglow plasma CVD, is an attractive method for the fabrication of defectless, high-quality thin-flilm materials (1). This techniqeu substantially differs from a direct plasma CVD in three major aspects.