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Nanosecond laser-induced damage of transparent conducting ITO film at 1064nm

机译:纳秒激光诱导1064nm透明透明膜的损伤

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Transparent conducting films with superior laser damage performance have drawn intense interests toward optoelectronic applications under high energy density environment. In order to make optoelectronic applications with high laser damage performance, a fundamental understanding of damage mechanisms of conducting films is crucial. In this study, we performed laser damage experiments on tin-doped indium oxide films (ITO, Bandgap = 4.0 eV) using a nanosecond (ns) pulse laser (1064 nm) and investigated the underlying physical damage mechanisms. Single ns laser pulse irradiation on ITO films resulted in common thermal degradation features such as melting and evaporation although the laser photon energy (1.03 eV, 1064 nm) was smaller than the bandgap. Dominant laser energy absorption of the ITO film is attributed to free carriers due to degenerate doping. Upon multi-pulse irradiation on the film, damage initiation and growth were observed at lower laser influences, where no apparent damage was formed upon single pulse, suggesting a laser-induced incubation effect.
机译:具有优异激光损伤性能的透明导电薄膜对高能量密度环境下的光电应用感兴趣。为了使具有高激光损伤性能的光电应用,对导电膜的损伤机制的基本理解至关重要。在这项研究中,我们使用纳秒(NS)脉冲激光(1064nm)对锡掺杂氧化铟氧化膜(ITO,带隙= 4.0eV)进行激光损伤实验,并研究了潜在的物理损伤机制。 ITO膜上的单个NS激光脉冲辐照导致诸如熔化和蒸发的常见的热劣化特征,尽管激光光子能量(1.03eV,1064nm)小于带隙。由于退化掺杂,ITO膜的主导激光能量吸收归因于自由载体。在多脉冲对膜上的辐射时,在较低的激光影响下观察到损伤引发和生长,在单脉冲时没有形成明显的损伤,表明激光诱导的孵化效果。

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