Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist

摘要

Progress in the fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist followed by replication into epoxy or polymer materials is described. The technology enables a wide range of micro-optical elements to be fabricated and replicated using Ni shims electroformed from the photoresist originals. Examples of fabricated micro-optical elements are described, including microlens arrays, Fresnel microlenses, kinoforms, and other continuous microrelief phase elements.