Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and rf magnetron sputtering

摘要

Molybdenum/silicon multilayers were deposited by ion beam sputtering and radio-frequency magnetron sputtering. X-ray reflection, transmission electron microscopy and Auger electron spectroscopy studies were performed to characterize these multilayers. There was a difference in soft x-ray reflectivity. The reason for the difference was found to be the difference in the thickness of silicide layers which were formed at each interface of the multilayers.