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Thin-film characterization and photothermal absolute calibration measurements using high-frequency electric currents

机译:使用高频电流的薄膜表征和光热绝对校准测量

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For quantitative photothermal investigation of both thermal and optical properties of thin films it is necessary to calibrate the observed signals. For thermoreflectance measurements this is the absolute surface temperature rise while for photothermal displacement measurements the slope of the sample surface deformation must be related to the energy absorbed from the heating beam. Such calibration is obtained by imaging the spatial distribution of ac current heating in metallic layers incorporated into a thin film system. We present experimental evidence that results from both techniques and can serve as a direct measure for the squared current density in the film. The surface temperature and thermoelastic response was calculated using simple one- dimensional models for the surface temperature and thermoelastic expansion. It is demonstrated that the method is well suited for an accurate absolute calibration of photothermal thin film measurements. The possible use of the Joule heating methods for thermal characterization of thin films and imaging of thin film microstructures is discussed.
机译:对于薄膜的热敏和光学性质的定量光热研究,需要校准观察到的信号。对于热度反射测量,这是绝对表面温度上升,而对于光热位移测量,样品表面变形的斜率必须与从加热梁吸收的能量有关。通过在掺入薄膜系统中的金属层中的AC电流加热的空间分布来获得这种校准。我们提出了两种技术的实验证据,并且可以用作薄膜中平方电流密度的直接测量。使用简单的一维模型来计算表面温度和热弹性响应,用于表面温度和热弹性膨胀。结果证明,该方法非常适合于光热薄膜测量的精确绝对校准。讨论了用于薄膜热表征的焦耳加热方法和薄膜微结构的成像。

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