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Dynamics of S production in the 193-nm photodissociation of CH3SCH3 CH3SSCH3 CH3SH and H2S

机译:CH3SCH3 CH3SSCH3 CH3SH和H2S的193-NM Photodissoation中生产动态。

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The production of S($+3$/P, $+1$/D, $+1$/S) in the 193 nm photodissociation of CH$-3$/SCH$-3$/, CH$-3$/SSCH$-3$/, CH$- 3$/SH, and H$-2$/S has been studied using 2 $PLU 1 REMPI techniques. The 193 nm photodissociation cross sections of the radicals CH$-3$/S and HS initially formed in the photodissociation of CH$-3$/SCH$-3$/, CH$-3$/SSCH$-3$/, CH$- 3$/SH, and H$-2$/S have been determined as 1 $MUL 10$+$MIN@18$/ cm$+2$/ using a rate equation scheme. The dominant product from CH$-3$/S is S($+1$/D), while that from SH is S($+3$/P). The formation of S($+3$/P) in the 1-photon (193 nm) photodissociation of CH$-3$/SSCH$-3$/ is also observed.
机译:193年NM Photodissocation的S($ 3 $ / p,$ + 1 $ / d,$ 1 $ + 1 $ + 1 $ / sch $ -3 $ /,ch $ -3 $ / SSCH $ -3 $ /,CH $ - 3 $ / SH,以及使用2 $ PLU 1 REMPI技术研究的HER $ -2 $ / s。 193 NM光度照相横截面的基团CH $ -3 $ / s和HS最初在CH $ -3 $ / SC $ -3 $ /,CH $ -3 $ / SSCH $ -3 $ /, CH $ - 3 $ / SH,H $ -2 $ / s已被确定为1 $ MUL 10 $ + $ MIN @ 18 $ / cm $ + 2 $ /使用速率等式方案。 CH $ -3 $ / s的主导产品是s($ + 1 $ / d),而sh是s($ + 3 $ / p)。在1-Photon(193nm)的CH $-3 $ / SSCH $ -3 / / $ /也被观察到的S($ + 3 $ / p)的形成。

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