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Fast and simple checking methods of the doping concentration in semiconductors

机译:半导体中掺杂浓度的快速简单的检查方法

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摘要

Four different possibilities are proposed for the fast checking of doping and impurity concentration in semiconductors. The proposition is based on the characteristic experimental concentration dependence of the breakdown voltage, the slope of the reverse I-V characteristics, the ac conductivity, and the capacitance at zero bias, obtained in planar and mesa Au/Cr/n-GaAs Schottky contacts.
机译:提出了四种不同的可能性,用于快速检查半导体中的掺杂和杂质浓度。该命题基于击穿电压的特征实验浓度依赖性,反向I-V特性的斜率,交流电导率和零偏压的电容,在平面和Mesa Au / Cr / n-GaAs肖特基触点中获得。

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