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P-n heterojunction and Schottky barrier formation between poly(3-methylthiophene) and n-type cadmium sulfide

机译:聚(3-甲基噻吩)和N型硫化镉之间的P-N异质结和肖特基势垒形成

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The electrical and optical properties of the junction between undoped semiconductor-like or highly doped metallic-like films of PMeT $LB@PMeT $EQ poly(3-methylthiophene)$RB and n-CdS are described. The junctions were prepared by photoelectrochemical deposition of the polymer onto the semiconductor surface from a solution of the monomer. Dark J-V measurements of the PMeT(undoped):n-CdS contact indicate rectifying behavior characteristic of a p-n junction diode, thus confirming that the undoped polymer is p-type. The photocurrent- photovoltage characteristics of the heterojunction under illumination appear stable, showing little sign of deterioration over a five-day period of observation. The presence of charge recombination centers at the p-PMeT:n-CdS interface and in the bulk is indicated. The photoresponse spectrum of the cell suggests that the observed photocurrent is due to both the polymer and n-CdS. The dark J-V characteristics of the PMeT(doped):n-CdS junction also signify a rectifying barrier. The rectification ratio of the junction is typical of a good metal- semiconductor contact. The electrical and photovoltaic properties of the doped polymer-based cell compare favorably with those of metal:n-CdS Schottky barrier devices. The parameters of the hybrid organic-inorganic heterojunction are compared with those of the Schottky barrier.
机译:描述了PMET $ LB @ PMET $ EQ Poly(3-甲基噻吩)$ RB和N-CD之间未掺杂的半导体样或高度掺杂金属状薄膜之间的电气和光学性质。通过将聚合物的光电化学沉积从单体溶液中的光电化学沉积在半导体表面上制备了结。 PMET的黑暗J-V测量(未掺杂):N-CDS触点表示P-N结二极管的整流行为特征,从而证实未掺杂的聚合物是p型。照明下的异质结的光电流 - 光伏特性看起来稳定,在五天的观察期间显示出的劣化迹象。表示P-P-P-P-P-Pet:N-CD界面和体积中的电荷重组中心的存在。细胞的光响应频谱表明观察到的光电流是由于聚合物和N-Cd。 PMET的黑暗J-V特性(掺杂):N-CDS结还表示整流屏障。结的整流比是典型的良好金属半导体接触。掺杂聚合物基细胞的电气和光伏性能与金属的电池相比:N-CDS肖特基势垒装置。将杂种有机 - 无机异质结的参数与肖特基屏障的参数进行比较。

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