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P-n heterojunction and Schottky barrier formation between poly(3-methylthiophene) and n-type cadmium sulfide

机译:聚(3-甲基噻吩)与n型硫化镉之间的P-n异质结和肖特基势垒形成

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Abstract: The electrical and optical properties of the junction between undoped semiconductor-like or highly doped metallic-like films of PMeT $LB@PMeT $EQ poly(3-methylthiophene)$RB and n-CdS are described. The junctions were prepared by photoelectrochemical deposition of the polymer onto the semiconductor surface from a solution of the monomer. Dark J-V measurements of the PMeT(undoped):n-CdS contact indicate rectifying behavior characteristic of a p-n junction diode, thus confirming that the undoped polymer is p-type. The photocurrent- photovoltage characteristics of the heterojunction under illumination appear stable, showing little sign of deterioration over a five-day period of observation. The presence of charge recombination centers at the p-PMeT:n-CdS interface and in the bulk is indicated. The photoresponse spectrum of the cell suggests that the observed photocurrent is due to both the polymer and n-CdS. The dark J-V characteristics of the PMeT(doped):n-CdS junction also signify a rectifying barrier. The rectification ratio of the junction is typical of a good metal- semiconductor contact. The electrical and photovoltaic properties of the doped polymer-based cell compare favorably with those of metal:n-CdS Schottky barrier devices. The parameters of the hybrid organic-inorganic heterojunction are compared with those of the Schottky barrier. !
机译:摘要:描述了未掺杂的类半导体或高度掺杂的类金属膜PMeT $ LB @ PMeT $ EQ聚(3-甲基噻吩)$ RB和n-CdS之间的结的电学和光学性质。通过从单体溶液将聚合物光电化学沉积到半导体表面上来制备结。 PMeT(未掺杂):n-CdS触点的暗J-V测量表明p-n结二极管的整流行为特征,从而证实了未掺杂的聚合物为p型。异质结在光照下的光电流-光电压特性看起来稳定,在五天的观察期内几乎没有退化迹象。指出了在p-PMeT:n-CdS界面和本体中存在电荷复合中心。电池的光响应光谱表明,观察到的光电流是由于聚合物和n-CdS所致。 PMeT(掺杂):n-CdS结的深色J-V特性也表示整流势垒。结的整流比是良好的金属-半导体接触的典型值。掺杂的聚合物基电池的电和光伏特性与金属:n-CdS肖特基势垒器件相比具有优势。将杂化有机-无机异质结的参数与肖特基势垒的参数进行了比较。 !

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