首页> 外文会议>IEEE International SOI Conference >SOI-Enabled MEMS Processes Lead to Novel Mechanical, Optical, and Atomic Physics Devices
【24h】

SOI-Enabled MEMS Processes Lead to Novel Mechanical, Optical, and Atomic Physics Devices

机译:启用S​​OI的MEMS流程导致新的机械,光学和原子物理设备

获取原文

摘要

Beginning in the mid-1990s, Sandia National Laboratories began its migration to Silicon-on-Insulator (SOI) wafers to develop a radiation-hardened semiconductor process for sub-0.5μm geometries. Successfully radiation hardening SOI technologies enabled an in-house processing familiarity that exceeded our expectations by opening opportunities to improve other technologies. Rather than rely on a single SOI technology, we have developed families of SOI processes using SOI wafers specifically tailored for each of a number of diverse applications. From this SOI expertise, we have designed, developed, and fabricated a number of novel devices that exploit a variety of mechanical, electrical, and optical phenomena, including atomic-physics based devices. We present a high-level description of our SOI process technologies using product examples. Of particular note are a novel accelerometer, RF MEMS microresonators and contacting switches, integrated optics (low-loss Si waveguides, the smallest and lowest power micro-ring modulators and thermo-optic phase modulators/switches), and ion traps for quantum computing (along with other atomic physics device examples).
机译:从20世纪90年代中期开始,Sandia National Laboratories开始迁移到绝缘体上的硅晶片,以开发辐射硬化的半导体过程,用于子0.5μm几何形状。成功辐射硬化SOI技术使内部加工熟悉能够超越我们的期望,以改善其他技术。我们而不是依靠单一SOI技术,我们已经开发了使用SOI晶片的SOI进程的家庭,专门针对许多不同的应用程序专门针对各种应用程序。从该SOI专门知识,我们已经设计,开发并制造了许多利用各种机械,电气和光学现象,包括基于原子的物理设备新颖设备。我们使用产品示例展示了我们SOI流程技术的高级描述。特别注意是一种新型加速度计,RF MEMS微管和接触开关,集成光学器件(低损耗SI波导,最小和最低电源微环调制器和热光相位调制器/开关)以及用于量子计算的离子阱(以及其他原子物理设备示例)。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号