Development of NIL-Template dry-cleaning process-VUV cleaning technology-(PPT)

摘要

1.Introduction.1.1 Photolithography on Memory Device.1.2 Nano-lmprint Lithography(NIL)applications.1.3 Resist residue and its removal on NIL template.1.4 Vacuum Ultraviolet(VUV)cleaning performance.2.Experiments and Results.2.1 Analysis of VUV damage and Particle on NIL template.2.2 Analysis of Organic contamination on NIL template.2.3 Model of particle adsorption on NIL template.3.Summary.