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Observation of photobleaching and intensity dependent kinetics in Ge_(22)As_(22)Se_(56) thin films under sub-bandgap light illumination

机译:在子带隙光照射下的Ge_(22)AS_(22)SE_(56)SE_(56)SE_(56)薄膜中的光漂白和强度依赖性动力学

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We experimentally demonstrate photobleaching (PB) in Ge_(22)As_(22)Se_(56) thin films, when illuminated with a diode pumped solid state laser (DPSSL) of wavelength 671 nm, which is far below the optical bandgap of the sample. Interestingly, we found that PB is a slow process and occurs even at moderate pump beam intensity of 0.2 W/cm~2, however the kinetics remain rather different.
机译:我们在用波长671nm的二极管泵浦固态激光器(DPSSL)照射时,在GE_(22)AS_(22)SE_(22)SE_(56)SE_(56)SE_(56)薄膜中进行了实验证明了光漂白(PB),其远低于样本的光学带隙。有趣的是,我们发现PB是一种缓慢的过程,即使在0.2W / cm〜2的中等泵浦光束强度也会发生,但动力学仍然不同。

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