The possibility of using permanent magnets in planar magnetron installations for sputtering magnetic targets

摘要

The paper includes the results of numerical modeling of the spatial distribution of the magnetic field strength of a magnetron discharge. Special attention is paid to the case where the cathode-target is made of a magnetic material. The paper shows that it is possible to obtain the required value of magnetic field induction above the target surface from a magnetic material either at a target thickness of less than 2 mm or by using a heat removal constraint from the target surface.