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Hydrogen Gas Sensing Characterizations Based on Nanocrystalline SnO_2 Thin Films Grown on SiO_2/Si and Al_2O_3 Substrates

机译:基于SiO_2 / Si和Al_2O_3基材生长的基于纳米晶SnO_2薄膜的氢气传感表征

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High-quality nanocrystalline (NC) SnO_2 thin films were grown on SiO_2/Si and Al_2O_3 substrates using sol-gel spin coating method. The structural properties, surface morphologies and gas sensing properties of the NC SnO_2 were investigated. XRD measurements showed a tetragonal rutile structure and the diffraction peaks for NC SnO_2 thin films grown on Al_2O_3 substrates outperformed those of NC SnO_2 films grown on SiO_2/Si substrates. The surface morphology of the annealed SnO_2 thin films at 500°C appeared as polycrystalline with uniform nanoparticle distribution. Hydrogen (H_2) gas sensing performance of the NC SnO_2 was examined for H_2 concentrations ranging from 150 ppm to 1000 ppm at different temperatures (room temperature, 75 and 125°C) for over 50 min. The room temperature sensitivities for H_2 gas sensors based on NC SnO_2 thin films grown on Al_2O_3 and SiO_2/Si substrates was 2570% and 600%, respectively upon exposure to 1000 ppm of H_2 gas. While the sensitivity values at 125°C increased to 9200% and 1950%, respectively.
机译:使用溶胶 - 凝胶旋涂法在SiO_2 / Si和Al_2O_3基板上生长高质量的纳米晶(NC)SnO_2薄膜。研究了NC SnO_2的结构性,表面形貌和气体传感性能。 XRD测量显示了四边形金红石结构,并且在Al_2O_3底物上生长的NC SnO_2薄膜的衍射峰优于在SiO_2 / Si衬底上生长的NC SnO_2膜的衍射峰。在500℃下退火的SnO_2薄膜的表面形态出现为具有均匀纳米颗粒分布的多晶硅。在不同温度(室温,75和125°C)以超过50分钟的情况下,检查NC SnO_2的氢气(H_2)气体感测性能。(室温,75和125℃)超过50分钟,检查了150ppm至1000ppm的H_2浓度。基于在Al_2O_3和SiO_2 / Si衬底上生长的NC SnO_2薄膜的H_2气体传感器的室温敏感性分别在暴露于1000ppm的H_2气体时分别为2570%和600%。虽然125°C时的敏感值分别增加到9200%和1950%。

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