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Studies of Resistive-type Hydrogen-Sensitive Sensors Using Pd-Based Thin Films

机译:基于Pd基薄膜的电阻式氢敏感传感器的研究

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Zigzag-shaped Pd-based thin films (pure Pd and Pd-SiO_2 mixture with thickness ranged from 10 nm to 100 nm deposited on cover-glass substrates were used to fabricate resistive-type hydrogen sensors. It is found that relative sensitivities are independent of the thin-film thickness and are 10%, 7.4%, 6.1%, and 5% for the pure-Pd sensor in 2%, 1.5%, 1%, and 0.5% H_2/N_2, respectively. However, its response time (t_a) is substantially influenced by the thin-film thickness for pure-Pd resistive-type sensor. t_a is measured with a thickness coefficient of 0.14 s/nm in 2% H_2/N_2 while it is 0.5 s/nm in 1% H_2/N_2. Compared to the pure-Pd sensor, the Pd-SiO_2 sensor has a shorter response time (20 s to 33 s) and a higher relative sensitivity (8.7% to 6.1%) in 1% H_2/N_2. In 3% H_2/N_2, relative sensitivity is even as high as 15.2% with a response time of 10 s.
机译:基于Zigag形的Pd基薄膜(纯Pd和厚度为10nm至100nm沉积在覆盖在覆盖玻璃基板上的纯Pd和Pd-siO_2混合物用于制造电阻式氢传感器。发现相对敏感性独立于薄膜厚度和纯PD传感器分别为2%,1.5%,1%和0.5%H_2 / N_2的纯PD传感器的10%,7.4%,6.1%和5%。但是,它的响应时间( T_A)基本上受纯PD-PD电阻型传感器的薄膜厚度的影响。在2%H_2 / N_2中,在2%H_2 / N_2中以0.14 s / nm的厚度系数测量T_A,而在1%H_2中为0.5 s / nm / N_2。与纯PD传感器相比,PD-SiO_2传感器具有较短的响应时间(20秒至33秒),相对敏感性较高(8.7%至6.1%),1%H_2 / N_2。在3%H_2中/ N_2,相对灵敏度甚至高达15.2%,响应时间为10 s。

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