Migration and deposition of lunar dust on the optical element surface in the simulated electrostatic environment

摘要

The migration and deposition experiments of lunar dust on the optical element surface in the simulated electrostatic environment, combined with theoretical analysis and simulation prediction, have been conducted in this paper, which identified the influence of dust deposition on camera imaging. Electrostatic charging and migration properties of lunar dust were first theoretically analyzed. The magnitude of the electrical migration rate of 10 ~(-1)m / s has been derived. It was then suggested that the critical adhesion speed played an important role during the process of dust migration and deposition. Base on the simulation results, it was presented that the initial distance of the attached particles from the lunar equipment surface was located in an ellipsoid range. Moreover, the relationship between deposition thickness and imaging ability was established by experimental study for planar lens and convex lens respectively. It was also found that with the increase of the deposition thickness, the deposition layer would have serious impact on the optical element performance or furthermore destroy the device, while reaching or exceeding the critical thickness. The research results in this study would have significance for better understanding of the migration and sedimentary characteristics of lunar dust and further protecting the lunar exploration equipment from dust hazards on lunar surface in the future.