首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography >Scatterometric analysis of a plasmonic test structure
【24h】

Scatterometric analysis of a plasmonic test structure

机译:等离子体试验结构的散射分析

获取原文

摘要

Traditional ellipsometric measurements of copper gratings are limited to Angstrom resolution and are rather insensitive to changes in the critical dimension (CD) or pitch of the structure. By adding another grating perpendicular and with larger CD and pitch, sensitivity is greatly enhanced. The spectra of one dimensional gratings is largely featureless over a wide range of CDs while crossed-gratings exhibit large minima which shift with changing CDs of less than an Angstrom. This improvement is due to plasmonic activity in the crossed-grating, demonstrated in detail here. Mueller matrix element analysis under azimuthal rotation provides information about cross-polarization and plasmon coupling conditions.
机译:铜光栅的传统椭圆测量值限于抗埃分辨率,并且对临界尺寸(CD)或结构间距的变化相当不敏感。通过添加另一个垂直和较大的CD和俯仰,大大提高了灵敏度。在宽范围的CD上,一维光栅的光谱在很大程度上是无言的,而交叉光栅表现出大量的最小值,其变化的CD小于埃克斯特罗姆。这种改进是由于交叉光栅中的等离子体活性,这里详细说明。方位角旋转下的Mueller矩阵元件分析提供了关于交叉极化和等离子体耦合条件的信息。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号