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MOCVD growth and thermal analysis of Sb_2Te_3 thin films and nanowires

机译:SB_2TE_3薄膜和纳米线的MOCVD生长和热分析

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Sb_2Te_3 is a chalcogenide compound of great interest, due to its applications in the fields of phase change, thermoelectric devices, as well as of topological insulators. In this work, the MOCVD deposition of both Sb_2Te_3 thin films and nanowires was performed by using the same set of precursors and exploiting the low temperature deposition for thin films and VLS mechanisms for nanowires. A special attention was dedicated to the analysis of the thermal properties, performed by scanning thermal microscopy and modulated photothermal radiometry techniques. The thermal conductivity of the thin layers was compared to that of a nanowire, finding that the values are comparable to those reported for bulk Sb_2Te_3.
机译:Sb_2te_3是一种硫属化物的大兴趣化合物,因为它在相变,热电装置以及拓扑绝缘体领域的应用。在这项工作中,通过使用相同的一组前体进行SB_2TE_3薄膜和纳米线的MOCVD沉积,并利用用于纳米线的薄膜的低温沉积和用于纳米线的VLS机构。特别注意通过扫描热显微镜和调制的光热辐射技术进行的热性能分析。将薄层的导热率与纳米线的导热率相比,发现该值与批量SB_2TE_3报告的值相当。

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