Influence of layer material and structure on barrier and elongation properties of SiO_x-based multilayer CVD barrier coatings

摘要

Plasma processes constantly gain importance in the field of plastics processing. Due to their macromolecular structure plastics do not offer sufficient barrier functionality against oxygen and water vapor permeation, which is a key demand in a variety of applications. A common solution in plastics processing is the deposition of thin silicon oxide layers (SiO_x) using microwave (MW) excited plasma processes. Unfortunately for some applications silicon oxide barrier coatings on flexible polymers are likely to fail at low strain levels.