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Memristor Drift Model Based on Conservation of Mobile Vacancies

机译:基于移动空缺保护的忆故漂移模型

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A significant-percentage of the analysis applied to memristors is based on the Linear Drift Model. In the Linear Drift Model the resistance of the doped region increases in direct proportion to the width of the doped region. It is shown that this is not consistent with the physical conservation of the mobile vacancies. A circuit model is proposed which is consistent with the conservation of the mobile vacancies and takes into account a high constant intrinsic resistivity indicative of the memristor "off state". A numerical analysis(NA) scheme is tested and compared with reported Hewlett Packard memristor data and with the theoretical solution for the Linear Drift Model.
机译:施加到忆离子的显着百分比基于线性漂移模型。在线性漂移模型中,掺杂区域的电阻与掺杂区域的宽度的直接成比例增加。结果表明,这与移动职位空缺的物理保护并不一致。提出了一种电路模型,其符合移动空缺的守恒,并且考虑了指示忆阻器“关闭状态”的高常数内在电阻率。测试数值分析(NA)方案,并与报告的Hewlett Packard Memitristor数据和线性漂移模型的理论解决方案进行了比较。

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