Effect of Spatial Image Transfer in a Pulse MOC VD Process

摘要

The deposition of HfO_2 and MgO layers from Hf(thd)_4 and Mg(thd)_2 by Pulse MOCVD technique with discrete-reagents dosage in slit systems with uniform and nonuniform susbtrqate materials is considered. The obtained layers were studied by menas of scanning ellipsometry. The effect of the three-dimensional image transfer in the slit structure from one substrate to the opposite one in hte form of a relief nanometer-sized film was discovered. This effect may be used for non-lithographic formation of film structures.