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Theoretical search for p-type dopants in Mg_2X (X= Si, Ge) semiconductors for thermoelectricity

机译:用于热电的MG_2x(X = SI,GE)半导体的理论上的p型掺杂剂

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Electronic structure calculations of doped Mg_2(Si-Ge) semiconductors were performed by the charge self-consistent Korringa-Kohn-Rostoker method with the coherent potential approximation (KKR-CPA) in order to search for p-type impurities. It was predicted that Li and Na (located on Mg site) as well as B, Ru, Mo and W (located on Si site) are expected to behave as hole donors in Mg_2(Si-Ge). Using the calculated density of states in doped Mg_2Si in the vicinity of the Fermi level, the linear term of thermopower was also estimated from the simplified Mott's formula. The RT Seebeck coefficient may range from 120μV/K (Li) to almost 300μV/K (Ru) at the 1% content of doped impurities.
机译:通过电荷自我一致的Korringa-Korringa-Kohn-Rostoker方法进行掺杂Mg_2(Si-Ge)半导体的电子结构计算,其具有相干电位近似(KKR-CPA)以寻找p型杂质。预测Li和Na(位于Mg位点)以及B,Ru,Mo和W(位于Si位点)上,预计将表现为Mg_2(Si-Ge)中的孔供体。在FERMI水平附近使用掺杂MG_2SI中的所计算的状态,来自简化的MOTT公式估计热电机的线性术语。 RT Seebeck系数可以在掺杂杂质的1%含量的1%含量的120μV/ k(Li)至近300μV/ k(Ru)的范围内。

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