Large Area PECVD Process Using Dual Rotatable Magnetrons

摘要

Magnetron PECVD is an emerging technology targeting the possibility to perform a chemical vapor deposition process at fairly high rates over large areas. The paper presents a new setup based on rotatable magnetrons. The precursor hexamethydisiloxane was used to deposit SiO_xC_y layers on polymer substrates. It could be shown that the formation of redeposition zones on the target can be avoided completely. The discharge voltage drift as it is typical for planar configuration is damped. These advantages could be optained on expense of deposition rate. The maximum achieved value was 180 nm*m/min which is higher than sputtering but lower compared to planar magnetron based PECVD. It could be demonstrated that the technology is stable over several hours deposition time. The optical properties of the layers are well suited for the usage as low refractive index materials in optical layer stacks. All experiments have been carried out on a pilot coater of 600 mm deposition width. Scale-up experiments to 2100 mm targets in a production coater have been done.