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Modified Diamond-Like Carbon Multilayer Coatings on Metallic Substrates Produced by Pulsed-DC Hollow Cathode PECVD

机译:通过脉冲-DC中空阴极PECVD生产的金属基材上改性金刚石碳多层涂层

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Diamond-like carbons (DLCs) have attracted much interest in recent decades, and have found a wide range of applications, including in optoelectronic devices, solar cells, infrared optics and, notably, as protective coatings for metals in corrosive and/or abrasive environment. These consist of the amorphous hydrogen-carbon alloys (a-C:H), hydrogen-free amorphous carbons (a-C) and tetrahedrally-structured amorphous carbons, (ta-C), which can contain in excess of 90% sp~3 bonding. In this paper, modified a-C:H type diamond-like carbon multilayer films have been deposited on a range of metallic substrates: nickel aluminium bronze, copper and 80/20 cupronickel alloy by pulsed-DC hollow cathode PECVD. The effects of substrate plasma pretreatment on the structure of both the substrate itself, and the structure and properties of the coating are considered. The protective effect of these coatings has been demonstrated by electrochemical techniques. The coatings are further characterized by Raman spectroscopy (with particular regard to the C-C sp~2/sp~3 bonding ratio), surface energy determination, SEM, and nanoindentation.
机译:钻石状的碳(DLC)近几十年来吸引了很多兴趣,并发现了广泛的应用,包括光电器件,太阳能电池,红外光学器件,特别是作为腐蚀性和/或研磨环境中的金属的保护涂层。这些包括无定形氢碳合金(A-C:H),无氢无定形碳(A-C)和四面体结构的无定形碳(TA-C),其可含有超过90%Sp〜3键合。在本文中,改性A-C:H型金刚石状碳多层膜已经沉积在一系列金属基材:镍铝青铜,铜和80/20铜合金中,通过脉冲DC中空阴极PECVD。考虑了基板等离子体预处理对衬底本身的结构的影响,以及涂层的结构和性质。通过电化学技术证明了这些涂层的保护作用。该涂层是通过拉曼光谱(特别是关于该C-C SP〜2 / SP〜3键的比例),表面能量确定,SEM和纳米压痕进一步表征。

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