X-ray Optics For Laser-Plasma Sources: Aplications Of Intense SXR And EUV Radiation Pulses

摘要

In this work we present a short review of SXR and EUV optics that have been designed and developed for experiments concerning material processing and imaging, using a laser-plasma radiation source based on a gas puff target. Three different kinds of mirrors employed as the EUV collectors are presented: the grazing incidence axisymmetrical ellipsoidal mirror, the grazing incidence multifoil mirror, and the ellipsoidal mirror with Mo/Si multilayer coating. Experiments concerning characterization of the mirrors were performed using EUV radiation from Kr or Xe plasmas produced in a double stream gas puff target irradiated with Nd:YAG laser pulses (4ns, 0.8 J, 10 Hz). Intensity of the focused radiation was sufficient for micromachining of organic polymers and surface modification of organic and inorganic solids. Different kinds of micro- and nanostructures created in near-surface layers of different kinds polymers were obtained. Significant differences were revealed in XPS spectra acquired for irradiated and not irradiated polymers.