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Improved electron injection in spin coated Alq_3 incorporated ZnO thin film in the device for solution processed OLEDs

机译:改进的电子注射在旋涂的Alq_3掺入溶液加工OLED的装置中的ZnO薄膜

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We deposit tris-(8-hydroxyquinoline)aluminum (Alq_3) incorporated zinc oxide (ZnO) thin films by spin coating method under the normal ambient. It showed the higher transmittance (90% at 550 nm) when compared to that (80% at 550 nm) of spin coated pure ZnO film. SEM studies show that the Alq3 incorporation in ZnO film also enhances the formation of small sized particles arranged in the network of wrinkles on the surface. XRD reveals the improved crystalline properties upon Alq3 inclusion. We fabricate the electron-only devices (EODs) with the structure of ITO/spin coated ZnO:Alq3 as ETL/Alq3 interlayer/LiF/Al. The device showed the higher electron current density of 2.75 mA/cm~2 at 12V when compared to that (0.82 mA/cm~2 at 12V) of the device using pure ZnO ETL. The device results show that it will be useful to fabricate the low-cost solution processed OLEDs for future lighting and display applications.
机译:我们在正常环境下通过旋涂法沉积三(8-羟基喹啉)铝(ALQ_3)掺入氧化锌(ZnO)薄膜。与纺丝涂覆的纯ZnO膜相比,它显示出较高的透射率(在550nm时)较高的透射率(80%)。 SEM研究表明,ZnO膜中的Alq3掺入还增强了布置在表面皱纹网络中的小尺寸粒子的形成。 XRD在Alq3夹杂物上揭示了改进的结晶性能。我们使用ITO /旋转涂覆的ZnO:Alq3作为Etl / Alq3中间层/ LiF / Al的结构,用ITO /旋涂的ZnO:Alq3的结构制造唯一的电子设备(EOD)。当使用纯ZnOEtl的装置的装置(12V时,12V)相比,该装置在12V时显示出2.75mA / cm〜2的更高的电子电流密度。设备结果表明,制造低成本解决方案的OLED可用于未来照明和显示应用是有用的。

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