Argon Dilution as an Alternative to Hydrogen Dilution for the Preparation of Large Area Device Quality Amorphous Silicon

摘要

In stead of using silane-hydrogen mixture we have used silane-argon mixture to develop device quality amorphous silicon on large area for solar cell application. Although silane-hydrogen mixture gives very good material, it increases the risk of fire hazard. On the other hand argon-silane mixture promotes a much safer process. In this work large area (20 X 20 cm~(2)) device quality amorphous silicon have been developed by argon dilution method for industrial use.