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Current Density Effects on the Structural and Magnetic Properties of CoNiFe Alloy Thin Films

机译:电流密度对血糖合金薄膜结构和磁性的影响

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摘要

CoNiFe alloy thin films with various current densities were galvanostatically electrodeposited on the pre-cleaned copper substrates. The higher value of saturation magnetization (4(pi)M_(s)) and low value of coercivity were obtained tuning the current density of CoNiFe alloy thin films.
机译:具有各种电流密度的基因合金薄膜在预清洗的铜基材上被电沉积地电沉积。获得饱和磁化的值越高(4(PI)M_(S))和矫顽力的低值进行调节,调整血糖合金薄膜的电流密度。

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