首页> 外文会议>Symposium on dielectric and advanced matter physics >Photoinduced Effects of Ferroelectric Domains in PbZr1-xTixO3 Thin Films as Obtained by Using Piezoresponse Force Microscopy
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Photoinduced Effects of Ferroelectric Domains in PbZr1-xTixO3 Thin Films as Obtained by Using Piezoresponse Force Microscopy

机译:通过使用压电响应力显微镜获得的PBZR1-Xtixo3薄膜铁电域的光导效应

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Piezoresponse force microscopy (PFM) has been used to investigate the photoinduced effect of ferroelectric domains in PbZr1-xTixO3 (PZT) thin films. In order to perform nondestructive visualization of the highresolution domain structure, we optimized the imaging condition, such as applying a lower voltage than 1.0 Vpp (peak-to-peak voltage). In this study, domain changes were measured before and after illumination on the surface of PZT films by using an UV light emitting diode (LED) source (A = 310 nm) with a focusing lens to investigate the influence of the photoinduced carriers on the ferroelectric polarization. In addition, to investigate the photoinduced effects on the domain distribution, we performed histogram of positive and negative domains before and after UV-light illumination. The illumination with UV light resulted in an increase of the positive domain of the out-of-plane mode. Also, a change in the out-of-plane domain distribution was observed before and after UV illumination. The relaxation of photoinduced changes was monitored by repeated scans within a time range of 20 ~ 60 minutes.
机译:压电响应力显微镜(PFM)已被用于研究铁电域在PBZR1-Xtixo3(PZT)薄膜中的光电域。为了执行高次化结构域结构的非破坏性可视化,我们优化了成像条件,例如施加低于1.0VPP的电压(峰值峰值电压)。在该研究中,通过使用具有聚焦透镜的UV发光二极管(LED)源(A = 310nm)来测量在PZT薄膜表面上的照射之前和之后测量结构域变化,以研究光抑制载体对铁电的影响极化。另外,为了研究对域分布的光致效果,我们在UV光照射前后进行正面和阴性域的直方图。具有UV光的照明导致平面外模式的正极结构域的增加。而且,在UV照明之前和之后观察到平面外结构域分布的变化。通过在20〜60分钟的时间范围内重复扫描监测光诱导的变化的放松。

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