首页> 外文会议>Annual Conference of the Chinese Society of Micro-Nano Technology >Effect of Flow Rate of Slurry in Micro-channels on The Consistency of Polishing Rate
【24h】

Effect of Flow Rate of Slurry in Micro-channels on The Consistency of Polishing Rate

机译:微通道浆料流动速率对抛光率稠度的影响

获取原文

摘要

According to the Bernoulli equation and Darcy formula, the flow model of slurry in micro-channels was established, it indicated that slurry viscosity is the main factor affecting the slurry mean velocity. According to the characteristics that liquid viscosity is mainly determined by the liquid temperature and the property that mechanical friction can improve the liquid temperature, the effects of slurry temperature, working pressure and polishing speed on the heterogeneity of polishing rate were investigated. The results showed that the effect of removal rate of each parameter on the central part of the copper film can be described as: slurry temperature > working pressure > polishing speed. In order to obtain the best planarization process, through the central composite experimental method, the technological parameters were optimized regarding the heterogeneity of polishing rate as response value. It was finally concluded that: when the slurry temperature was 21.60°C, the working pressure was 8.83kpa, the system speed was 43.92rpm, the predicted minimum value of the heterogeneity of polishing rate (HOPR) was 0.0574.
机译:根据伯努利方程和达西公式,建立了微通道中浆料的流动模型,表明浆料粘度是影响浆料平均速度的主要因素。根据液体粘度主要由液体温度决定的特性和机械摩擦可以改善液体温度的特性,研究了浆液温度,工作压力和抛光速度对抛光速率异质性的影响。结果表明,铜膜中央部分上的每个参数的去除率的效果可以描述为:浆料温度>工作压力>抛光速度。为了获得最佳的平面化过程,通过中央复合实验方法,技术参数对抛光率的异质性进行了优化,作为响应值。最后得出结论:当浆液温度为21.60℃时,工作压力为8.83kpa,系统速度为43.92rpm,预测抛光率(HOPR)的异质性最小值为0.0574。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号