首页> 外文会议>International Symposium on Advances in Abrasive Technology >Development of Three-Dimensional Dynamometer for Wafer grinder
【24h】

Development of Three-Dimensional Dynamometer for Wafer grinder

机译:晶圆研磨机的三维测功机的研制

获取原文
获取外文期刊封面目录资料

摘要

Grinding forces during grinding silicon wafer have great influences on the accuracy, surface quality and grinding yield of the wafer. It is necessary to develop an accurate and reliable grinding dynamometer for measuring and monitoring the grinding process of the large and thin wafer. In this work, a new 3D (three-dimensional) grinding dynamometer using piezoelectric sensors is designed and developed, which is used for a wafer grinder based on wafer rotating grinding method. The calibrating experiments of the 3D grinding dynamometer are carried out. The FEA and modal analysis are made and compared with the results of mode testing. Furthermore, the static performance parameters of the dynamometer are obtained from the loading experiment. The experiment results indicate that the 3D grinding dynamometer can measure axial, radial and tangential grinding force of grinding wheel with high sensitivity, good linearity, good repeatability and high natural frequency, and fully satisfied requirement for measuring and monitoring of the grinding force in wafer grinding process.
机译:研磨硅晶片期间的研磨力对晶片的精度,表面质量和研磨产量产生了极大的影响。有必要开发精确可靠的研磨测功机,用于测量和监测大薄晶片的研磨过程。在这项工作中,设计和开发了一种新的3D(三维)磨削测功机,其设计和开发,用于基于晶片旋转研磨方法的晶片研磨机。进行3D研磨测力计的校准实验。与模式测试的结果进行了比较了FEA和模态分析。此外,从负载实验中获得测功机的静态性能参数。实验结果表明,3D研磨测功机可以测量砂轮的轴向,径向和切向研磨力,具有高灵敏度,良好的线性,良好的可重复性和高自然频率,以及对晶片研磨中的研磨力的测量和监测的完全满意要求过程。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号