Results obtained with the CHARPAN Engineering Tooland prospects of the ion Mask Exposure Tool (iMET)

摘要

Projection Mask-Less Patterning (PMLP) is based on many hundred thousands of ion beams working in parallel. A PMLPproof-of-concept tool has been realized as part of the European project CHARPAN (Charged Particle Nanotech) and hasbeen presented at SPIE Photomask BACUS 2007. Using 10 keV protons, 16nm hp resolution has been demonstrated in non-CAR materials (HSQ) with 25μC/cm~2exposure dose. The system is upgraded to a CHARPAN Engineering Tool (CHET)with a laser-interferometer controlled vacuum stage and a CMOS based programmable Aperture Plate System (APS)providing ca. 40,000 beams with < 20nm spot size. The engineering of an ion Mask Exposure Tool (iMET) for the 22nm hpmask node has been started; main iMET features are discussed.