首页> 外文会议>International symposium on photomask technology >Results from the KLA-Tencor TeraScanXR reticle inspection tool
【24h】

Results from the KLA-Tencor TeraScanXR reticle inspection tool

机译:KLA-Tencis Terascanxr掩盖检查工具的结果

获取原文

摘要

The new TeraScanXR reticle inspection system extends the capability of the previous TeraScanHR platform to advanced32nm logic and 40nm Half Pitch (HP) memory technology nodes. The TeraScanXR has been designed to provide asignificant improvement in image quality, defect sensitivity and throughput relative to the HR platform. Defectsensitivity is increased via a combination of improved Die-to-Die (D:D) and Die-to-Database (D:DB) algorithms, as wellas enhancements to the image auto-focus (IAF). Modifications to system optics and the introduction of a more powerfulimage processing computer have enabled a –2X faster inspection mode. In this paper, we describe the key features of theTeraScanXR platform and present preliminary data that illustrate the capability of this tool. TeraScanHR tools currentlyat customer sites are field-upgradeable to the TeraScanXR configuration.
机译:新的TerascanXR掩模版检查系统将前一个Terascanhr平台的能力扩展到Advanced32nm逻辑和40nm半间距(HP)内存技术节点。 Terascanxr旨在提供相对于HR平台的图像质量,缺陷敏感性和吞吐量的显着提高。通过改进的模具 - 模具(D:D)和模具到数据库(D:DB)算法的组合增加了缺陷敏感性,因为对图像自动对焦(IAF)的井筒增强。对系统光学系统的修改以及引入更强大的处理计算机的启用了-2倍更快的检查模式。在本文中,我们描述了TheterAscanXR平台的关键特征,并提出了初步数据,说明了该工具的能力。 Terascanhr工具目录客户站点是TerascanXR配置的现场升级。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号