Fundamental Understanding of Burning Behavior of UV-Cured Thiol-Ene Networks

摘要

The field of photocurable polymers is rapidly growing and expanding into new applications. A success of UV-curing was largely determined by its inherent advantages such as high reactive efficiency, eco-friendly formulations that do not emit VOCs, the possibility of using a variety of processing techniques , i.e. spraying, dipping, or rolling of a reactive mixture on a substrate prior to curing which occurs in seconds with UV light. In particular photocurable thiol-ene networks recently brought considerable attention due to the fact that curing reaction in these systems proceeds via a unique radical mediated step growth mechanism which defines the uniformity of a network structure, leads to low shrinkage and insensitivity to oxygen inhibition as compared to traditional photocurable aery late and methyl methacrylate networks which are prone to these problems. Because of these additional advantages the thiol-ene networks can potentially replace acrylate and methyl methacryalate based systems in certain applications.