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Microscopic Recombination Kinetics in High Quality, Fully Coalesced a-plane GaN ELO Structures Investigated by ps-time-resolved Cathodoluminescence Microscopy

机译:高质量的微观重组动力学,通过PS - 时间分离的阴极致发光显微镜研究了全耦合的A平面GaN Elo结构

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摘要

The recombination kinetics of the free exciton (FX) and basal plane stacking fault (BSF) emission in a-plane GaN epitaxial lateral overgrowth structures is analyzed by ps-time-resolved cathodoluminescence microscopy in the temperature range from 5K to 300K. The capture of FX by donors and the thermionic emission of holes from the BSF Quantum Well is analyzed.
机译:通过PS - 时间分辨的阴极发光显微镜在5k至300​​k的温度范围内分析了平面GaN外延横向过度生长结构的自由激子(FX)和基底平面堆叠故障(BSF)发射的重组动力学。分析了供体的捕获和来自BSF量子孔的孔的热离子发射。

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